The Collagen 3X Moisture Nourishing Mask from Enough is enriched with collagen and designed for express facial care. The product is made on a hypoallergenic basis, which fits snugly to the skin, allowing the bioactive concentrate to be actively absorbed and guaranteeing visible results after a 15-minute procedure.
The essence formula contains three forms of collagen. This naturally occurring ingredient actively replaces the lack of the skin’s own protein, strengthens the structure of the epidermis, promotes healing and rejuvenation, and increases the effectiveness of moisturizing care. The mask’s composition is supplemented with panthenol and retinol. Vitamins improve skin tone and strengthen local tissue immunity.
Sastāvs: Aqua, Propylene Glycol, Glycerin, Niacinamide, Helianthus Annuus (Sunflower) Seed Oil, 1,2-Hexanediol, Polysorbate 60, Caprylic/Capric Triglyceride, Glyceryl Stearate, PEG-100 Stearate, Chlorphenesin, Polyacrylate-13, Hydroxyethylcellulose, Carbomer, Arginine, Polyisobutene, Panthenol, Adenosine, Disodium EDTA, Polysorbate 20, Sorbitan Isostearate, Gluconolactone, Chamomilla Recutita (Matricaria) Flower Extract, Butylene Glycol, Soluble Collagen(22.65Ppm), Hydrolyzed Collagen(23.65Ppm), Collagen Extract(22.65Ppm), Sodium Hyaluronate, Phenoxyethanol, Dipropylene Glycol, Schisandra Chinensis Fruit Extract, Rhus Semialata Extract, Hypericum Perforatum Leaf Extract, Hamamelis Virginiana (Witch Hazel) Extract, Camellia Sinensis Leaf Extract, Beta-Glucan, Atelocollagen, Centella Asiatica Extract, Hydrogenated Lecithin, Ethylhexylglycerin, Phytosterols, Retinol, Tripeptide-1, Palmitoyl Tripeptide-1, Ceramide NP, Parfum
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