Dr. Althea 345 Relief Cream Mask is an intensive regenerating mask that provides powerful regeneration for skin in need of immediate soothing and deep reconstruction. The product is specially designed for sensitive, problematic, and tired skin that suffers from irritation, rashes, or has a compromised protective barrier. Thanks to its high concentration of active ingredients, the mask’s essence works at the cellular level, triggering rejuvenation and healing processes. It instantly relieves skin stress, eliminates redness, and restores a healthy, rested appearance to the face.
The uniqueness of the mask lies in its rich composition, combining the power of natural extracts and the latest biotechnological components, such as PDRN. The thick creamy texture of the essence provides long-lasting hydration and leaves a comfortable finish, creating a weightless layer that prevents moisture loss. The product is ideal for recovery after cosmetic procedures, exposure to harsh weather conditions, or during acne flare-ups. Regular use helps strengthen the skin’s immunity, even out micro-relief, and control sebum.
Sastāvs: Aqua, Melaleuca Alternifolia (Tea Tree) Leaf Water, Methylpropanediol, 1,2-Hexanediol, Butylene Glycol, Glycerin, Niacinamide, Octyldodeceth-16, Triethylhexanoin, Caprylic/Capric Triglyceride, Pentylene Glycol, Carbomer, Hydroxyethylcellulose, Tromethamine, Allantoin, Trehalose, Caprylyl Glycol, Ethylhexylglycerin, Dipotassium Glycyrrhizate, Disodium EDTA, Panthenol, Glycine Soja (Soybean) Seed Extract, Sodium Hyaluronate, Hydrolyzed Hyaluronic Acid, Pantothenic Acid, Centella Asiatica Leaf Water, Cyclodextrin, Centella Asiatica Extract, Hydrogenated Lecithin, Madecassoside, Ceramide NP, Cholesterol, Camellia Sinensis Leaf Water, Resveratrol, Beta-Glucan, Sodium Dna, Nelumbo Nucifera Leaf Extract
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